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The LED core manufacturing equipment developed by Shanghai Ideal Energy Co., Ltd. - Metal Organic Chemical Vapor Deposition (MOCVD) equipment was successfully launched, and 37 sets of equipment application verification contracts were signed with Taiwan's Canyuan Optoelectronics Co., Ltd. The scale of industrialization laid the foundation.
As an important new green light source product, MOCVD equipment is the most critical manufacturing equipment in the entire LED lighting industry chain, and its equipment cost accounts for about 50 of the cost of the entire chip equipment. Due to the high technical content and complicated manufacturing process, the global MOCVD equipment market is currently dominated by two foreign equipment suppliers. Shanghai Ideal Energy Equipment Co., Ltd. independently developed a single-chamber MOCVD reaction chamber with a single-cavity 84-piece 2-inch epitaxial wafer and a 3-cavity 252-chip cluster multi-cavity automated MOCVD system in less than two years. It broke through the technical development barriers of similar equipment abroad.
In recent years, with the increasing penetration of high-brightness LEDs in outdoor displays, LCD panel backlights, automotive applications, etc., especially in the semiconductor lighting market, the demand for mass-production MOCVD equipment has exploded, globally. The annual demand is hundreds of units and the market size is billions of dollars. China's LED epitaxial chips and packages have achieved remarkable achievements in terms of scale and quality. The proportion of localized products has been significantly improved, but key equipment, especially mass-production MOCVD, still relies on imports, and production costs remain high, seriously restricting the LED industry. development of. Therefore, the development of a more cost-effective domestic commercial MOCVD equipment is an urgent requirement for LED epitaxial chip companies.
Based on the process verification results and customer feedback, the second generation mass production MOCVD equipment was developed on the basis of the first generation prototype. The single cavity can produce 84 2 inch epitaxial wafers at one time, exceeding the mainstream imported equipment. Mass production models have significantly improved in terms of output rate, reliability, and operational economy, breaking through the technical development barriers of similar foreign equipment.